Hardness and Structure of a-CNxFilms Synthesized by Chemical Vapor Deposition

Autor: Daisuke Tanaka, Daisuke Tanaka, Yoshiaki Ohkawara, Yoshiaki Ohkawara, Noriko Itoh, Noriko Itoh, Shigeo Ohshio, Shigeo Ohshio, Haruhiko Ito, Haruhiko Ito, Hidetoshi Saitoh, Hidetoshi Saitoh
Zdroj: Japanese Journal of Applied Physics; July 2000, Vol. 39 Issue: 7 p4148-4148, 1p
Abstrakt: Mechanically hard a-CNxfilms were synthesized using a combination of ion bombardment and the chemical vapor deposition process using the dissociative excitation reaction of BrCN with Ar metastable atoms. Nanoindentation tests disclosed that the indentation hardness, Young's modulus and elastic recovery increased with increasing ion-accelerating voltage. Moreover, the degree of flow among clusters decreased in the ion-bombarded sample. The D (disordered)-band absorption on an infrared absorption spectrum was replaced by a C-N absorption assigned to the tertiary aromatic amine. These results suggest that the internal and external structures of the carbon nitride cluster change from the two-dimensional order to the three-dimensional order of C-N. The structure of hard a-CNxis clearly distinguishable from nitrogen-containing diamond-like carbon.
Databáze: Supplemental Index