Structures and Electrical Properties of Fullerene Thin Films on Si(111)-7×7 Surface Investigated by Noncontact Atomic Force Microscopy

Autor: Kei Kobayashi, Kei Kobayashi, Hirofumi Yamada, Hirofumi Yamada, Toshihisa Horiuchi, Toshihisa Horiuchi, Kazumi Matsushige, Kazumi Matsushige
Zdroj: Japanese Journal of Applied Physics; June 2000, Vol. 39 Issue: 6 p3827-3827, 1p
Abstrakt: We have studied the fullerene (C60) multilayer thin film deposited on the Si(111)-7×7 reconstructed surface by noncontact atomic force microscopy (NC-AFM) under an ultrahigh-vacuum (UHV) condition. The double domain structure on a terrace of the crystalline island was successfully imaged. We have also simultaneously measured the contact potential difference (CPD) by the Kelvin probe method. Small CPD variations, which are not due to coupling with the topographic image, were measured at a molecular scale.
Databáze: Supplemental Index