| Autor: |
Quan, Yong Chun, Joo, Jongryang, Yeo, Sanghak, Jung, Donggeun |
| Zdroj: |
Japanese Journal of Applied Physics; March 2000, Vol. 39 Issue: 3 p1325-1325, 1p |
| Abstrakt: |
The effects of deposition pressure on the properties of cyclohexane-based plasma polymer (CHexPP) thin films were investigated. Deposition of CHexPP thin films at higher deposition pressures was associated with lower deposition rates and produced thin films with lower k-values, lower thermal stabilities and higher etching rates. It is considered that the higher deposition pressure decreases the energies of the charged reactive species generated by the plasma from the precursor molecules, resulting in less dense and less well cross-linked plasma polymer thin films. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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