| Autor: |
Ban, Masahito, Takenaka, Tsuyoshi, Hayashi, Kunihiko, Katsumi Suzuki, Katsumi Suzuki, Youichi Enomoto, Youichi Enomoto |
| Zdroj: |
Japanese Journal of Applied Physics; August 1996, Vol. 35 Issue: 8 p4318-4318, 1p |
| Abstrakt: |
We present an improvement in the patterning process of microwave devices by suppressing the oxygen effusion from the patterning edge of YBa2Cu3O7-x(YBCO) thin film. The damage in the edge is estimated from unloaded Qfactors of YBCO-based micro-stripline resonators, because the high frequency current is limited along the edge. The unloaded Qfactors increase with the oxygen content during the plasma etching. This result suggests that oxygen radicals in the Ar+O2plasma restore the oxygen in the edge and reduce the loss of microwave devices. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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