| Autor: |
Hideyuki Kondo, Hideyuki Kondo, Shigenari Yanagi, Shigenari Yanagi, Kazushige Takaishi, Kazushige Takaishi, Takayuki Shingyouji, Takayuki Shingyouji, Tatsuo Yoshinobu, Tatsuo Yoshinobu, Hiroshi Iwasaki, Hiroshi Iwasaki |
| Zdroj: |
Japanese Journal of Applied Physics; May 1996, Vol. 35 Issue: 5 pL616-L616, 1p |
| Abstrakt: |
The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 µm. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
|
