| Autor: |
Kasukabe, Yoshitaka, Ootubo, Junichi, Nagata, Shinji, Kishimoto, Mokuyoshi, Fujino, Yutaka, Yamaguchi, Sadae, Yukio Yamada, Yukio Yamada |
| Zdroj: |
Japanese Journal of Applied Physics; June 1995, Vol. 34 Issue: 6 p3234-3234, 1p |
| Abstrakt: |
Nitrogen ions ( N2+) with 62 keV have been implanted into 100-nm-thick Ti films evaporated on thermally cleaned NaCl substrates. Unimplanted and N-implanted Ti films have been examined by transmission electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. The analysis has provided evidence that N-implantation results in the epitaxial formation of NaCl-type TiNyand simultaneously induces the release of H from evaporated-Ti films containing TiHx. The nitriding of evaporated-Ti films is mainly divided into two elemental processes. One is accompanied by the hcp-fcc transformation and the other is not. The formation mechanism for TiNyis discussed. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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