| Autor: |
Tanaka, Toshihiko, Morigami, Mitsuaki, Oizumi, Hiroaki, Taro Ogawa, Taro Ogawa, Shou-ichi Uchino, Shou-ichi Uchino |
| Zdroj: |
Japanese Journal of Applied Physics; December 1994, Vol. 33 Issue: 12 pL1803-L1803, 1p |
| Abstrakt: |
A resist hardening method that prevents resist pattern bending is described. In this method, a photo-crosslinking resist is flood exposed during rinsing. This exposure increases the crosslinking ratio of the resist, thus hardening the resist pattern before drying. Using this method, a 1.6-µm-thick 0.25-µm line-and-space pattern can be delineated without resist bending. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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