Device Simulation with Quasi Three-Dimensional Temperature Analysis for Short-Channel Poly-Si Thin-Film Transistor

Autor: Tamio Shimatani, Tamio Shimatani, Takuji Matsumoto, Takuji Matsumoto, Takeshi Hashimoto, Takeshi Hashimoto, Noriji Kato, Noriji Kato, So Yamada, So Yamada, Mitsumasa Koyanagi, Mitsumasa Koyanagi
Zdroj: Japanese Journal of Applied Physics; January 1994, Vol. 33 Issue: 1 p619-619, 1p
Abstrakt: A new poly-Si thin-film transistor (TFT) device simulator for quasi three-dimensional temperature analysis has been developed. In this simulator, the influences of the grain boundaries are incorporated into the mobility model when the basic semiconductor equations are solved. Furthermore, we have taken into account the self-heating effect owing to a small thermal conductivity of the insulating substrate using quasi three-dimensional temperature analysis. We could accurately analyse the temperature rise effect and the avalanche short-channel effect in the short-channel poly-Si TFT.
Databáze: Supplemental Index