Development and Applications of a Compact Electron Cyclotron Resonance Source

Autor: O'keeffe, Patrick, Komuro, Shuji, Den, Shoji, Morikawa, Takitaro, Yoshinobu Aoyagi, Yoshinobu Aoyagi
Zdroj: Japanese Journal of Applied Physics; November 1991, Vol. 30 Issue: 11 p3164-3164, 1p
Abstrakt: A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O*for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H*beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100°C.
Databáze: Supplemental Index