| Autor: |
Mahmood Nasser, Mahmood Nasser, Yasunori Ohtsu, Yasunori Ohtsu, Gen Tochitani, Gen Tochitani, Hiroharu Fujita, Hiroharu Fujita |
| Zdroj: |
Japanese Journal of Applied Physics; July 1997, Vol. 36 Issue: 7 p4722-4722, 1p |
| Abstrakt: |
Potential oscillations of electronegative plasmas have been experimentally studied in a strongly asymmetric rf (13.56 MHz) discharge. Oscillation amplitudes in the plasma were found to increase suddenly from 10 to 60 V with increasing concentration of SF6gas in He gas, while gradually from 10 to 40 V in CF4mixed plasma. The electron energy distribution functions (EEDFs) measurement predicted an electron beam travelling from the plasma towards the rf electrode because of the potential double layer in the sheath picked up by an emissive probe. A clear difference in potential formation and EEDFs profiles in comparison to those in electropositive plasmas has been detected. A more marked gas concentration dependence was obtained in a SF6gas than in a CF4one due to the more active production of negative ions in a SF6plasma. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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