| Autor: |
Haruhiko Ito, Haruhiko Ito, Masanobu Ikeda, Masanobu Ikeda, Masafumi Ito, Masafumi Ito, Masaru Hori, Masaru Hori, Takashi Takeo, Takashi Takeo, Hajime Hattori, Hajime Hattori, Toshio Goto, Toshio Goto |
| Zdroj: |
Japanese Journal of Applied Physics; July 1997, Vol. 36 Issue: 7 pL880-L880, 1p |
| Abstrakt: |
Carbon atom densities in an inductively coupled radio frequency (13.56 MHz) CO and CO and H2mixed plasmas were successfully measured for the first time using ultra-violet absorption spectroscopy (UVAS) with a carbon hollow cathode lamp. This method, developed for monitoring carbon atoms in-situ in the plasmas, is very useful for the investigation of etching and chemical vapor deposition (CVD) processes containing carbon atoms and the sputtering system employing a carbon target. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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