| Autor: |
Katsumi Mori, Katsumi Mori, Soichiro Okamura, Soichiro Okamura |
| Zdroj: |
Japanese Journal of Applied Physics; August 1992, Vol. 31 Issue: 8 pL1143-L1143, 1p |
| Abstrakt: |
We have found that metal naphthenate thin films reacted with an energized electron beam of 30 keV and that the structured metal naphthenate in the submicron range could be prepared through the development of electron-irradiated samples using the organic solvent, toluene. The electron beam sensitivity of the metal naphthenate films was about 2×10-3C/cm2, which showed higher sensitivity than that of the electron beam induced chemical vapour deposition but lower than that of PMMA resist. After the heat treatment at 450°C for 20 minutes, submicron patterns of the composite oxide, consisting of a few kinds of oxides, were prepared. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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