| Autor: |
Murakami, Katsuhiko, Oshino, Tetsuya, Kinoshita, Hiroo, Watanabe, Takeo, Niibe, Masato, Ito, Masaaki, Oizumi, Hiroaki, Yamanashi, Hiromasa |
| Zdroj: |
Japanese Journal of Applied Physics; December 1998, Vol. 37 Issue: 12 p6750-6750, 1p |
| Abstrakt: |
We have designed and started the fabrication of 3-mirror ring-field projection optics for extreme ultraviolet lithography (EUVL) and an experimental exposure system using the projection optics, which enable a large-field (30 mm×20 mm), high-resolution (<100 nm) exposure. EUV exposure experiments will be performed using the EUVL beam line to be constructed at the new synchrotron ring called New Subaru, which is now under construction in Hyogo Prefecture. In this paper the details of the EUV exposure system will be described. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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