Pattern-centric yield management approach with machine learning to detect and track defects with full chip coverage
| Autor: | Yuan, Chi-Min, Kim, Ryoung-Han, Zhang, Yu, Yu, Shirui, Liu, Jiaqi, Meng, Renyang, Yin, Long, Wang, Kai, Cai, Kun, Zhang, Xingdi, Song, Xinghua, Ren, Jiadong, Vikram, Abhishek, Yan, Changlian, Cheng, Guojie, Wang, Hui, Zhang, Qing, Liao, Wenkui |
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| Zdroj: | Proceedings of SPIE; April 2021, Vol. 11614 Issue: 1 p1161406-1161406-8 |
| Databáze: | Supplemental Index |
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