Innovative dual mark design for alignment verification and process monitoring in advanced lithography
| Autor: | Owa, Soichi, Phillips, Mark C., Chang, Jia Hung, Lio, En Chuan, Lin, Junjin, Weng, Tang Chun, Lin, Bill, Lomtscher, Patrick, Freitag, Martin, Buhl, Stefan, Hsu, Hsiao Lin, Liu, Rex H. |
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| Zdroj: | Proceedings of SPIE; March 2021, Vol. 11613 Issue: 1 p116130K-116130K-21, 11496892p |
| Databáze: | Supplemental Index |
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