Alternative developer solution/process for EUV lithography: ethyltrimethylammonium hydroxide (ETMAH)
| Autor: | Felix, Nelson M., Lio, Anna, Santillan, Julius Joseph, Harumoto, Masahiko, Motono, Tomohiro, Figueiredo dos Santos, Andreia, Mori, Chisayo, Tanaka, Yuji, Stokes, Harold, Asai, Masaya, Itani, Toshiro |
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| Zdroj: | Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116090W-116090W-6, 1044817p |
| Databáze: | Supplemental Index |
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