EUV dark field lithography: extreme resolution by blocking 0th order
| Autor: | Felix, Nelson M., Lio, Anna, Brunner, Timothy A., Santaclara, Jara G., Bottiglieri, Gerardo, Anderson, Chris, Naulleau, Patrick |
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| Zdroj: | Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p1160906-1160906-11 |
| Databáze: | Supplemental Index |
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