Low-Pressure MetalOrganic Chemical Vapor Deposition of Transparent and p-Type Conducting CuCrO2 Thin Films with High ConductivityThe authors thank Anil Mane for assistance in the fabrication of the CVD apparatus and M. S. Dharmaprakash for providing the CVD precursors. They are grateful to M. S. Hegde for providing the XPS data, to Titas Dasgupta for help with the conductivity measurements, and to V. Venkataraman for the Hall measurements.
| Autor: | Mahapatra, S. |
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| Zdroj: | Chemical Vapor Deposition; October 2003, Vol. 9 Issue: 5 p238-240, 3p |
| Abstrakt: | No abstract. |
| Databáze: | Supplemental Index |
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