| Autor: |
KANAEV, A. I., RYBAKOV, S. Yu., CHURAEVA, M. N., KANAEV, A. I., RYBAKOV, S. Yu., CHURAEVA, M. N. |
| Zdroj: |
Journal de Physique IV - Proceedings; December 1993, Vol. 3 Issue: 1 pC3-183-C3-188, 1833186p |
| Abstrakt: |
The characteristics of a-B/C : H films, produced by PECVD on Si (100) surface using the novel harmless precursorcarborane have been studied. These films proved to be excellent for protection tokamaks inner surfaces, for they are heat-proof and chemically resistant. EPMA and ellipsometry used together enabled to determine not only the films composition and thickness, but also the density and some other parameters. A special computer program based on Yakovitz-Newbury method has been developed to study rather thin ([MATH]100nm) films by EPMA. Spectroellipsometry was used to determine the wave dependence of the films optical constants. It has been established that B/C ratio grows from 1 to 3.6 with increasing in carborane pressure and does not depend on a substrate temperature and voltage applied. EPMA measurements performed in cooperation with ellipsometry showed the increasing microporosity (up to 40%) for the film exposed to the fluence of deuterium ions about 1021cm-2. |
| Databáze: |
Supplemental Index |
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