| Autor: |
Hitchman, M. L., Zhao, J., Hitchman, M. L., Zhao, J. |
| Zdroj: |
Journal de Physique IV - Proceedings; September 1999, Vol. 9 Issue: 1 pPr8-357-Pr8-364, 3578357p |
| Abstrakt: |
The crystalline structures of titanium dioxide (TiO2) thin films deposited on various substrates by LPCVD for temperatures <322°C using titanium tetrabutoxide (TTB) have been studied. It has been found that the structures are dependent on the deposition temperature. XRD and Raman scattering show that amorphous TiO2is formed below 215°C, anatase between 236°C~257°C, a mixture of anatase and rutile at ca 270°C, mainly rutile between 279°C-290°C, and pure rutile above 300°C. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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