| Autor: |
Michalowski, Andreas, Nyenhuis, Fabian, Kunz, Gerhard |
| Zdroj: |
PhotonicsViews; June 2020, Vol. 17 Issue: 3 p42-45, 4p |
| Abstrakt: |
The aim in ultrashort‐pulsed materials processing is generally to keep interactions between the effects of the individual laser pulses to a minimum in order to minimize quality‐reducing effects and to avoid exceeding process‐specific thresholds. A contrasting approach aims at exploiting the interaction of consecutively applied laser pulses with the respective material response. In this case, it is possible to use particularly high average laser powers as well as bursts that feature time intervals of only a few nanoseconds. |
| Databáze: |
Supplemental Index |
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