High sensitivity non-CAR resists for EUV and EB lithography
| Autor: | Gronheid, Roel, Sanders, Daniel P., Morita, Kazuyo, Yamamoto, Kimiko, Harumoto, Masahiko, Tanaka, Yuji, Mori, Chisayo, Arisawa, You, Motono, Tomohiro, Stokes, Harold, Asai, Masaya |
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| Zdroj: | Proceedings of SPIE; May 2020, Vol. 11326 Issue: 1 p113260C-113260C-8, 1019349p |
| Databáze: | Supplemental Index |
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