EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity
| Autor: | Gronheid, Roel, Sanders, Daniel P., Nagahara, Seiji, Dinh, Cong Que, Yoshida, Keisuke, Shiraishi, Gosuke, Kondo, Yoshihiro, Yoshihara, Kosuke, Nafus, Kathleen, Petersen, John S., De Simone, Danilo, Foubert, Philippe, Vandenberghe, Geert, Stock, Hans-Jürgen, Meliorisz, Balint |
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| Zdroj: | Proceedings of SPIE; May 2020, Vol. 11326 Issue: 1 p113260A-113260A-15, 11212756p |
| Databáze: | Supplemental Index |
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