Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
| Autor: | Felix, Nelson M., Lio, Anna, van de Kerkhof, Mark, Yakunin, Andrei, Kvon, Vladimir, van de Wetering, Ferdi, Cats, Selwyn, Heijmans, Luuk, Nikipelov, Andrey, Lassise, Adam, Banine, Vadim |
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| Zdroj: | Proceedings of SPIE; March 2020, Vol. 11323 Issue: 1 p113230Y-113230Y-12, 11209783p |
| Databáze: | Supplemental Index |
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