| Autor: |
Malachowski, Karl, Verbeeck, Rita, Dupont, Tania, Chen, Chang, Li, Yi, Musa, Silke, Stakenborg, Tim, Sabuncuoglu, Deniz, and, Tezcan, Van, Pol |
| Zdroj: |
ECS Transactions; March 2013, Vol. 50 Issue: 12 p413-422, 10p |
| Abstrakt: |
Plasmonic nanoslits have great potential for single molecule applications. We report a wafer scale process for these structures using process steps compatible with a standard CMOS fab environment. This process allows a large scale fabrication of designed nanoslits with extremely small gap sizes and lengths tuned to exhibit optical resonances. Moreover, adjacent grating nano-antennas were successfully implemented, generating strong and localized electric fields in the nanoslit. These slits have practical applications in surface enhanced Raman spectroscopy-based molecular sensing and plasmonic tweezers. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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