| Autor: |
Dussault, Donald, Dragoi, Viorel |
| Zdroj: |
ECS Transactions; August 2014, Vol. 64 Issue: 1 p213-220, 8p |
| Abstrakt: |
The work presented in this paper describes experimental results achieved through the use of megasonic energy in standard MEMS wet processes in two different areas, microlithography (photo resist strip) and wafer cleaning. In all experiments the substrates were processed in a single wafer spin module with a large area megasonic transducer held in proximity to the substrate surface. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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