| Autor: |
Plach, Thomas, Rebhan, Bernhard, Dragoi, Viorel, Wagenleitner, Thomas, Wimplinger, Markus, Lindner, Paul |
| Zdroj: |
ECS Transactions; July 2018, Vol. 86 Issue: 5 p145-158, 14p |
| Abstrakt: |
This paper aims to present an overview of the existing wafer-to-wafer alignment technology. The development of optical alignment methods will be reviewed with respect to applications requirements evolution over time. An overview of the different factors contributing to the overall misalignment budget and how they are controlled now, or will be in the future, in order to meet the stringent requirements will be presented with examples. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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