| Autor: |
Alekseev, R.A., Alieva, Aleksandra I., Kucal, Ewelina |
| Zdroj: |
Key Engineering Materials; September 2019, Vol. 822 Issue: 1 p640-646, 7p |
| Abstrakt: |
The purpose of this work was to study and carry out glass etching of monocrystalline silicon using the Bosch method, acquaintance with the conditions of aspect-independent etching. The Bosch process was conducted using sulfur hexafluorideSF6 and perfluorocyclobutaneC4F8on OxfordInstrumentsPlasmaPro®Estrelas100. It was found that in order to level the problems that arise, it is necessary to vary the temporal relations of etching and passivation stages. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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