Lithographic effects due to particles on high-NA EUV mask pellicle
| Autor: | Behringer, Uwe F., Finders, Jo, Devaraj, Lokesh, Bottiglieri, Gerardo, Erdmann, Andreas, Wählisch, Felix, Kupers, Michiel, van Setten, Eelco, Fliervoet, Timon |
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| Zdroj: | Proceedings of SPIE; August 2019, Vol. 11177 Issue: 1 p111770V-111770V-14, 11065245p |
| Databáze: | Supplemental Index |
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