New silicon hard mask material development for sub-5nm node
| Autor: | Gronheid, Roel, Sanders, Daniel P., Seko, Tomoaki, Kasai, Tatsuya, Serizawa, Ryuuichi, Dei, Satoshi, Sakai, Tatsuya |
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| Zdroj: | Proceedings of SPIE; March 2019, Vol. 10960 Issue: 1 p1096025-1096025-7 |
| Databáze: | Supplemental Index |
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