N-Doped TiO2Photocatalyst Coatings Synthesized by a Cold Atmospheric Plasma

Autor: Chen, Qianqian, Ozkan, Alp, Chattopadhyay, Basab, Baert, Kitty, Poleunis, Claude, Tromont, Alisson, Snyders, Rony, Delcorte, Arnaud, Terryn, Herman, Delplancke-Ogletree, Marie-Paule, Geerts, Yves H., Reniers, François
Zdroj: Langmuir; June 2019, Vol. 35 Issue: 22 p7161-7168, 8p
Abstrakt: This work presents a simple, fast (20 min treatment), inexpensive, and highly efficient method for synthesizing nitrogen-doped titanium dioxide (N-TiO2) as an enhanced visible light photocatalyst. In this study, N-TiO2coatings were fabricated by atmospheric pressure dielectric barrier discharge (DBD) at room temperature. The composition and the chemical bonds of the TiO2and N-TiO2coatings were characterized by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). The results indicate that the nitrogen element has doped the TiO2lattice, which was further confirmed by Raman spectroscopy and grazing incidence X-ray diffraction (GIXRD). The doping mechanism was investigated using OES to study the plasma properties under different conditions. It suggests that the NH radicals play a key role in doping TiO2. The concentration of nitrogen in the N-TiO2coatings can be controlled by changing the concentration of NH3in the plasma or the applied power to adjust the concentration of NH radicals in the plasma. The band gap of N-TiO2was reduced after NH3/Ar plasma treatment from 3.25 to 3.18 eV. Consequently, the N-TiO2coating showed enhanced photocatalytic activity under white-light-emitting-diode (LED) irradiation. The photocatalytic degradation rate for the N-TiO2coating was about 1.4 times higher than that of the undoped TiO2coating.
Databáze: Supplemental Index