Impact of EUV absorber variations on wafer patterning
Autor: | Goldberg, Kenneth A., Melvin, Lawrence S., Kandel, Yudhishthir, Fühner, Tim, Welling, Ulrich, Gallagher, Emily, Frommhold, Andreas, Shusuke, Yoshitake |
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Zdroj: | Proceedings of SPIE; March 2019, Vol. 10957 Issue: 1 p109570N-109570N-8, 986139p |
Databáze: | Supplemental Index |
Externí odkaz: |