Impact of EUV absorber variations on wafer patterning

Autor: Goldberg, Kenneth A., Melvin, Lawrence S., Kandel, Yudhishthir, Fühner, Tim, Welling, Ulrich, Gallagher, Emily, Frommhold, Andreas, Shusuke, Yoshitake
Zdroj: Proceedings of SPIE; March 2019, Vol. 10957 Issue: 1 p109570N-109570N-8, 986139p
Databáze: Supplemental Index