E-beam based EUV mask characterization for studying mask induced wafer effects
| Autor: | Gallagher, Emily E., Rankin, Jed H., Vaenkatesan, Vidya, Tian, Qing, Gallagher, Emily, Wiley, Jim, Finders, Jo, Kubis, Michael, Mulkens, Jan, Kuan, Chiyan, Gao, Kevin |
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| Zdroj: | Proceedings of SPIE; October 2018, Vol. 10810 Issue: 1 p108100U-108100U-8, 972909p |
| Databáze: | Supplemental Index |
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