Rapid image-based pupil plane characterization for EUV lithography systems

Autor: Ronse, Kurt G., Hendrickx, Eric, Naulleau, Patrick P., Gargini, Paolo A., Itani, Toshiro, Levinson, Zac, Verduijn, Erik, Brunner, Timothy, Wood, Obert, Smith, Bruce W.
Zdroj: Proceedings of SPIE; October 2018, Vol. 10809 Issue: 1 p108090O-108090O-11, 10700922p
Databáze: Supplemental Index