Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models
| Autor: | Behringer, Uwe F., Finders, Jo, Teyssedre, H., Quemere, P., Chartoire, J., Delachat, F., Boudaa, F., Perraud, L., May, M. |
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| Zdroj: | Proceedings of SPIE; September 2018, Vol. 10775 Issue: 1 p107750A-107750A-7, 969758p |
| Databáze: | Supplemental Index |
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