Exploration of resist effect in source mask optimization
| Autor: | Kye, Jongwook, Owa, Soichi, Chen, Ao, Foong, Yee Mei, Maeng, Jae Yeol, Jain, Nikhil, McDermott, Steve |
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| Zdroj: | Proceedings of SPIE; March 2018, Vol. 10587 Issue: 1 p105870J-105870J-11, 10481142p |
| Databáze: | Supplemental Index |
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