Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models

Autor: Kye, Jongwook, Owa, Soichi, Menchtchikov, Boris, Socha, Robert, Zheng, Chumeng, Raghunathan, Sudhar, Aarts, Igor, Shome, Krishanu, Lee, Jonathan, de Ruiter, Chris, Rijpstra, Manouk, Megens, Henry, Brinkhof, Ralph, Teeuwisse, Floris, Karssemeijer, Leendertjan, Lyulina, Irina, Li, Chung-Tien, Hermans, Jan, Leray, Philippe
Zdroj: Proceedings of SPIE; March 2018, Vol. 10587 Issue: 1 p105870C-105870C-10, 10481141p
Databáze: Supplemental Index