Novel EUV resist materials for 7 nm node and beyond

Autor: Hohle, Christoph K., Gronheid, Roel, Furutani, Hajime, Shirakawa, Michihiro, Nihashi, Wataru, Sakita, Kyohei, Oka, Hironori, Fujita, Mitsuhiro, Omatsu, Tadashi, Tsuchihashi, Toru, Fujimaki, Nishiki, Fujimori, Toru
Zdroj: Proceedings of SPIE; March 2018, Vol. 10586 Issue: 1 p105860G-105860G-9, 952750p
Databáze: Supplemental Index