Ultimate edge-placement control using combined etch and lithography patterning optimizations

Autor: Hohle, Christoph K., Gronheid, Roel, Peterson, Brennan, Wise, Rich, van der Straten, Koen, Viantka, Katja, Luca, Melisa, Mokhlespour, Salman, Kubis, Michael, Cattani, Giordano, Hellin, David, Sobieski, Daniel, Dixit, Girish, Shamma, Nader, Rutigliani, Vito, Jaenen, Patrick, Halder, Sandip, Leray, Philippe
Zdroj: Proceedings of SPIE; March 2018, Vol. 10586 Issue: 1 p105860A-105860A-8, 952749p
Databáze: Supplemental Index