Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications
| Autor: | Goldberg, Kenneth A., Felix, Nelson M., Finders, Jo, Wang, Ziyang, McNamara, John, Rispens, Gijsbert, Broman, Pär, Ahn, Chang-Nam, Lee, Inhwan, Kim, Hwan, Kang, Junghyun, Hyun, Yoonsuk, Lim, Chang-Moon |
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| Zdroj: | Proceedings of SPIE; March 2018, Vol. 10583 Issue: 1 p105830Y-105830Y-6, 952477p |
| Databáze: | Supplemental Index |
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