| Autor: |
Cuquerella, M. C., Bosca, F., Miranda, M. A., Belvedere, A., Catalfo, A., Guidi, G. de |
| Zdroj: |
Chemical Research in Toxicology; April 2003, Vol. 16 Issue: 4 p562-570, 9p |
| Abstrakt: |
Photodegradation of ofloxacin (OFX) under aerobic conditions gives rise to N-demethylation, mainly involving coupling of radical cation OFX•+ with superoxide radical anion. Although H2O2 is produced as a byproduct, oxidative damage to DNA to give 8-OH-dGuo is associated with a type II mechanism. When the photosensitizing potentials of OFX and rufloxacin (RFX) are compared under the same conditions, the latter is shown to produce a much higher degree of DNA oxidation despite the close structural similarity. This is explained by a decrease of the triplet energy when sulfur instead of oxygen is attached to position 8 of the fluoroquinolone ring system. As a consequence, phosphate anions are able to quench OFX triplet but not RFX triplet; this reveals that the reaction medium has a strong influence on the photochemistry of OFX and hence on its photobiological properties. |
| Databáze: |
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