Improved particle control for high volume semiconductor manufacturing for nanoimprint lithography

Autor: Takehisa, Kiwamu, Yonekawa, Masami, Nakayama, Takahiro, Nakagawa, Kazuki, Maeda, Toshihiro, Matsuoka, Yoichi, Emoto, Keiji, Azuma, Hisanobu, Takabayashi, Yukio, Aghili, Ali, Mizuno, Makoto, Choi, Jin, Jones, Chris E.
Zdroj: Proceedings of SPIE; July 2017, Vol. 10454 Issue: 1 p104540R-104540R-6, 940867p
Databáze: Supplemental Index