MTO-like reference mask modeling for advanced inverse lithography technology patterns
| Autor: | Takehisa, Kiwamu, Park, Jongju, Moon, Jongin, Son, Suein, Chung, Donghoon, Kim, Byung-Gook, Jeon, Chan-Uk, LoPresti, Patrick, Xue, Shan, Wang, Sonny, Broadbent, Bill, Kim, Soonho, Hur, Jiuk, Choo, Min |
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| Zdroj: | Proceedings of SPIE; July 2017, Vol. 10454 Issue: 1 p104540J-104540J-5, 940866p |
| Databáze: | Supplemental Index |
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