| Autor: |
Tawara, Takeshi, Miyazawa, Tetsuya, Ryo, Mina, Miyazato, Masaki, Fujimoto, Takumi, Takenaka, Kensuke, Matsunaga, Shinichiro, Miyajima, Masaaki, Otsuki, Akihiro, Yonezawa, Yoshiyuki, Kato, Tomohisa, Okumura, Hajime, Kimoto, Tsunenobu, Tsuchida, Hidekazu |
| Zdroj: |
Materials Science Forum; May 2017, Vol. 897 Issue: 1 p419-422, 4p |
| Abstrakt: |
Application of highly N-doped buffer layers or a (N+B)-doped buffer layer to PiN diodes to suppress the expansion of Shockley stacking faults (SSFs) from the epilayer/substrate interface was studied. These buffer layers showed very short minority carrier lifetimes of 30–200 ns at 250°C. The PiN diodes were fabricated with buffer layers of various thicknesses and were then tested under high current injection conditions of 600A/cm2. The thicker buffer layers with shorter minority carrier lifetimes demonstrated the suppression of SSFs expansion and thus that of diode degradation. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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