Novel methodology to optimize wafer alignment to enhance 14nm on product overlay
| Autor: | Erdmann, Andreas, Kye, Jongwook, Samudrala, Pavan, Chung, Woong Jae, Subramany, Lokesh, Gao, Haiyong, Aung, Nyan, Oh, Seung Chul, Lee, Shawn, Delvigne, Erik, Minghetti, Blandine |
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| Zdroj: | Proceedings of SPIE; March 2017, Vol. 10147 Issue: 1 p101471U-101471U-6, 913246p |
| Databáze: | Supplemental Index |
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