Co-optimization of lithographic and patterning processes for improved EPE performance
| Autor: | Engelmann, Sebastian U., Wise, Rich S., Maslow, Mark J., Timoshkov, Vadim, Kiers, Ton, Jee, Tae Kwon, de Loijer, Peter, Morikita, Shinya, Demand, Marc, Metz, Andrew W., Okada, Soichiro, Kumar, Kaushik A., Biesemans, Serge, Yaegashi, Hidetami, Di Lorenzo, Paolo, Bekaert, Joost P., Mao, Ming, Beral, Christophe, Larivière, Stephane |
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| Zdroj: | Proceedings of SPIE; April 2017, Vol. 10149 Issue: 1 p101490N-101490N-16, 10047527p |
| Databáze: | Supplemental Index |
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