LPP-EUV light source for HVM lithography

Autor: Schuoecker, Dieter, Majer, Richard, Brunnbauer, Julia, Saito, T., Ueno, Y., Yabu, T., Kurosawa, A., Nagai, S., Yanagida, T., Hori, T., Kawasuji, Y., Abe, T., Kodama, T., Nakarai, H., Yamazaki, T., Mizoguchi, H.
Zdroj: Proceedings of SPIE; January 2017, Vol. 10254 Issue: 1 p102541A-102541A-5, 922875p
Databáze: Supplemental Index