Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system
| Autor: | Yoshioka, Nobuyuki, Hirano, Ryoichi, Iida, Susumu, Amano, Tsuyoshi, Watanabe, Hidehiro, Hatakeyama, Masahiro, Murakami, Takeshi, Suematsu, Kenichi, Terao, Kenji |
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| Zdroj: | Proceedings of SPIE; May 2016, Vol. 9984 Issue: 1 p99840M-99840M-6, 898567p |
| Databáze: | Supplemental Index |
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