Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks
| Autor: | Panning, Eric M., Goldberg, Kenneth A., Wojdyla, Antoine, Donoghue, Alexander, Benk, Markus P., Naulleau, Patrick P., Goldberg, Kenneth A. |
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| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9776 Issue: 1 p97760H-97760H-9, 879850p |
| Databáze: | Supplemental Index |
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