Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
| Autor: | Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Mao, Ming, Kocsis, Michael, De Schepper, Peter, Lazzarino, Frederic, Vandenberghe, Geert, Stowers, Jason, Meyers, Stephen, Clark, Benjamin L., Grenville, Andrew, Luong, Vinh, Yamashita, Fumiko, Parnell, Doni |
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| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9776 Issue: 1 p97760B-97760B-9, 879850p |
| Databáze: | Supplemental Index |
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